Micro Structures & Sensors Lab
Kenny Group @ Stanford

Karen Hyo Jin Kim

PhD Candidate

karenhjkim :at: mems.stanford.edu
440 Escondido Mall, Bldg 530 Rm 224, Stanford, CA 94305, USA
Advisor: Thomas W. Kenny


Thermal Accelerometer / Thin Film Deposition


Stanford University
(2015- present) PhD Candidate in Mechanical Engineering, PhD minor in Material Science

Stanford University
(2013 - 2015) M.S. in Mechanical Engineering

ChungAng University
(2009- 2013) B.S in Mechanical Engineering


Stanford University
(2018, 2017 Summer) Teaching Assistant
ME 232: Additive Manufacturing- From Fundamentals to Applications


Hyo Jin K. Kim, Kirsten E. Kaplan, Peter Schindler, Shicheng Xu, Martin M. Winterkorn, David B. Heinz, Timothy S. English, J. Provine, Fritz B. Prinz and Thomas W. Kenny, "Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition", ACS Appl. Mater. Interfaces, ASAP, 2019
J. Provine, Peter Schindler, Yongmin Kim, Steve P. Walch, Hyo Jin Kim, Ki-Hyun Kim and Fritz B. Prinz, "Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride", AIP Advances, 6, 065012, 2016
Yongmin Kim, J. Provine, Stephen P. Walch, Joonsuk Park, Witchukorn Phuthong, Anup L. Dadlani, Hyo-Jin Kim, Peter Schindler, Kihyun Kim, and Fritz B. Prinz, "Plasma-Enhanced Atomic Layer Deposition of SiN–AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid", ACS Appl. Mater. Interfaces, 8, 27, 2016
J Provine, Peter Schindler, Jan Torgersen, Hyo Jin Kim, Hans-Peter Karnthaler and Fritz B. Prinz, "Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors", J. Vac. Sci. Technol. A, 34, 2016